Plasma-induced chemical etching generating Ni<sub>3</sub>S<sub>2</sub> for formaldehyde detection

Jiaxin Zhou, Li Zhao, Qiang Wang, Lixin Zuo, Ana Zhao, Huimin Yu, Xue Jiang, Xiaoli Xiong

Plasma-induced chemical etching generating Ni₃S₂ for formaldehyde detection

Jiaxin Zhou, Li Zhao, Qiang Wang, Lixin Zuo, Ana Zhao, Huimin Yu, Xue Jiang, Xiaoli Xiong

中国化学快报 . 2022, (06): 3035 -3038 . DOI: 10.1016/j.cclet.2021.09.024