Plasma-induced chemical etching generating Ni<sub>3</sub>S<sub>2</sub> for formaldehyde detection

doi:10.1016/j.cclet.2021.09.024

中国化学快报 ›› 2022, Vol. 33 ›› Issue (06) : 3035-3038. DOI: 10.1016/j.cclet.2021.09.024

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Plasma-induced chemical etching generating Ni₃S₂ for formaldehyde detection

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Plasma-induced chemical etching generating Ni₃S₂ for formaldehyde detection

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{{article.zuoZheCn_L}}. {{article.title_cn}}. {{journal.qiKanMingCheng_CN}}. 2022, 33(06): 3035-3038 https://doi.org/10.1016/j.cclet.2021.09.024

{{article.zuoZheEn_L}}. {{article.title_en}}. {{journal.qiKanMingCheng_EN}}. 2022, 33(06): 3035-3038 https://doi.org/10.1016/j.cclet.2021.09.024

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Received	Revised	Published
2021-06-01	2021-07-29	2022-06-22
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2022-06-22

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