Photolithography-free fabrication of photoresist-mold for rapid prototyping of microfluidic PDMS devices

Photolithography-free fabrication of photoresist-mold for rapid prototyping of microfluidic PDMS devices

Shanshan Qin, Gaozhi Ou, Biao Wang, Zheyu Li, Rui Hu, Ying Li, Yunhuang Yang

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Chinese Chemical Letters ›› 2022, Vol. 33 ›› Issue (02) : 987-989. DOI: 10.1016/j.cclet.2021.07.045

Photolithography-free fabrication of photoresist-mold for rapid prototyping of microfluidic PDMS devices

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{{article.zuoZheEn_L}}. {{article.title_en}}. {{journal.qiKanMingCheng_EN}}. 2022, 33(02): 987-989 https://doi.org/10.1016/j.cclet.2021.07.045

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