Simultaneous removal of tetracycline and antibiotic resistant bacteria/genes in UV-LED/H2O2 system: Competitive interactions and wavelength dependence

Jie Wang, Jijie Zhang, Defang Ma, Zhenxiang Sun, Yan Wang, Qinyan Yue, Yanwei Li, Yue Gao, Baoyu Gao, Xing Xu

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中国化学快报 ›› 2026, Vol. 37 ›› Issue (02) : 111209. DOI: 10.1016/j.cclet.2025.111209
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Simultaneous removal of tetracycline and antibiotic resistant bacteria/genes in UV-LED/H2O2 system: Competitive interactions and wavelength dependence

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Simultaneous removal of tetracycline and antibiotic resistant bacteria/genes in UV-LED/H2O2 system: Competitive interactions and wavelength dependence

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{{article.zuoZheCn_L}}. {{article.title_cn}}. {{journal.qiKanMingCheng_CN}}. 2026, 37(02): 111209 https://doi.org/10.1016/j.cclet.2025.111209
{{article.zuoZheEn_L}}. {{article.title_en}}. {{journal.qiKanMingCheng_EN}}. 2026, 37(02): 111209 https://doi.org/10.1016/j.cclet.2025.111209

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